Method of manufacturing array substrate for liquid crystal display device

ABSTRACT

A method of manufacturing an array substrate for a liquid crystal display device includes forming a gate electrode, a gate line, and a gate pad on a substrate, forming a gate insulating layer on the gate electrode, the gate line, and the gate pad, forming an active layer on the gate insulating layer, forming an ohmic contact layer on the active layer, forming source and drain electrodes, a data line and a data pad on the ohmic contact layer, forming a pixel electrode, forming a gate pad terminal on the gate insulating layer, forming a data pad terminal covering the data pad, forming a passivation layer on the pixel electrode, the gate pad terminal and the data pad terminal, exposing the gate pad terminal and the gate pad by etching the passivation layer and the gate insulating layer, and exposing the data pad terminal by etching the passivation layer.

The present application is a Divisional of co-pending application Ser.No. 10/654,488 filed on Sep. 4, 2003, which claims the priority benefitof Korean Patent Application No. 2002-88084, filed in Korea on Dec. 31,2002. The entire contents of each of these applications are herebyincorporated by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a liquid crystal display (LCD) deviceand more particularly, to an array substrate for a liquid crystaldisplay device and a manufacturing method thereof.

2. Discussion of the Related Art

Generally, a liquid crystal display (LCD) device includes two substratesthat are spaced apart and face each other with a liquid crystal materiallayer interposed between the two substrates. Each of the substratesincludes electrodes that face each other, wherein a voltage applied toeach electrode induces an electric field between the electrodes andwithin the liquid crystal material layer. Alignment of liquid crystalmolecules of the liquid crystal material layer is changed by varying theintensity or direction of the applied electric field. Accordingly, theLCD device displays an image by varying light transmissivity through theliquid crystal material layer in accordance with the arrangement of theliquid crystal molecules.

FIG. 1 is a cross sectional view of an array substrate for a liquidcrystal display (LCD) device according to related art. In FIG. 1, a gateelectrode 12, a gate line 14, and a gate pad 16 are formed on atransparent insulating substrate 10. The gate electrode 12 is elongatedfrom the gate line 14, and the gate pad is located at an end portion ofthe gate line 14.

On the gate electrode 12, the gate line 14, and the gate pad 16 isformed a gate insulating layer 20, on which over the gate electrode 12,an active layer 22 and an ohmic contact layer 24 are sequentiallyformed.

On the ohmic contact layer 24 source and drain electrodes 32 and 34 areformed, and on the gate insulating layer 20 a data pad 36 having thesame material as the source and drain electrodes 32 and 34 is formed.Though not shown in FIG. 1, on the gate insulating layer 20, a data lineconnected to the source electrode 32 and the data pad 36 is formed. Thesource and drain electrodes 32 and 34 form a thin film transistor T withthe gate electrode 12.

Next, the source and drain electrodes 32 and 34, and the data pad 36 arecovered by a passivation layer 40 that has first, second, and thirdcontact hole for exposing the drain electrode 34, the gate pad 16, andthe data pad 36, respectively.

Next, on the passivation layer 40, a transparent conductive material isdeposited and patterned to form a pixel electrode 52, a gate padterminal 54, and a data pad terminal 56. The pixel electrode 52 isconnected to the drain electrode via the first contact hole 42, and aportion of the pixel electrode 52 overlaps with the gate line 14. Thegate pad terminal 54 and the data pad terminal 56 are connected to thegate pad 16 and the data pad 36 via the second and the third contactholes 44 and 46, respectively.

The array substrate as explained above is manufactured byphotolithographic processes using 5 masks, and the photolithographicprocess includes cleaning, deposition of the photoresist layer, exposureto light, development, etching, and so on. Therefore, if onephotolithographic process step can be eliminated in the manufacturing ofthe array substrate, the manufacturing time and the cost can be reduced.

SUMMARY OF THE INVENTION

Accordingly, the present invention is directed to a manufacturing methodof an array substrate for a liquid crystal display device thatsubstantially obviates one or more problems due to limitations anddisadvantages of the related art.

An advantage of the present invention is to provide a method ofmanufacturing an array substrate for a liquid crystal display devicethat shortens manufacturing time and cost.

Additional features and advantages of the present invention will be setforth in the description which follows, and in part will be apparentfrom the description, or may be learned by the practice of theinvention. The objectives and other advantages of the present inventionwill be realized and attained by the structure particularly pointed outin the written description and claims hereof as well as the appendeddrawings.

To achieve these and other advantages and in accordance with the purposeof the present invention, as embodied and broadly described, a method ofmanufacturing an array substrate for a liquid crystal display deviceincludes forming a gate electrode, a gate line and a gate pad on asubstrate, attaching a first KAPTON tape on the gate pad, forming a gateinsulating layer on the substrate having the first KAPTON tape, formingan active layer on the gate insulating layer over the gate electrode,forming an ohmic contact layer on the active layer, forming source anddrain electrodes, a data line, and a data pad, forming a pixel electrodeconnected to the drain electrode, forming a data pad terminal coveringthe data pad, attaching a second KAPTON tape on the data pad terminal,forming a passivation layer on the substrate having the second KAPTONtape, and detaching the first and the second KAPTON tapes to expose thegate pad terminal and the data pad terminal. The step of forming theactive layer and the step of forming source and drain electrodes, thedata line and the data pad can be processed through onephotolithographic process. At this time, the photolithographic processmay use a diffraction exposure technique. The step of forming the datapad terminal and the step of forming the pixel electrode can be carriedout at the same time.

In another aspect, a manufacturing method of an array substrate for aliquid crystal display device includes forming a gate electrode, a gateline, and a gate pad on a substrate, disposing a first metal mask on thegate pad, forming a gate insulating layer, an amorphous silicon layer, adoped silicon layer, and a metal layer on the substrate after disposingthe first mask, removing the first metal mask, patterning the metallayer, the doped silicon layer, and the amorphous silicon layer using adiffraction exposure technique to form source and drain electrodes, adata line, a data pad, an ohmic contact layer, and an active layer,forming a pixel electrode contacting the drain electrode, forming a gatepad terminal and a data pad terminal covering the gate pad and the datapad, respectively, disposing second and third metal masks on the gatepad and data pad terminals, respectively, forming a passivation layer onthe substrate after disposing the second and third masks, and removingthe second and the third masks. The step of forming the gate padterminal and the data pad terminal may be carried out simultaneouslywith the step of forming the pixel electrode.

In another aspect, a manufacturing method of an array substrate for aliquid crystal display device includes forming a gate electrode, a gateline, and a gate pad on a substrate, forming a gate insulating layer onthe gate electrode, the gate line, and the gate pad, forming an activelayer on the gate insulating layer over the gate electrode, forming anohmic contact layer on the active layer, forming source and drainelectrodes, a data line and a data pad on the ohmic contact layer,forming a pixel electrode contacting the drain electrode, forming a gatepad terminal on the gate insulating layer such that a portion of thegate insulating layer is open over the gate pad, forming a data padterminal covering the data pad, forming a passivation layer on the pixelelectrode, the gate pad terminal and the data pad terminal, exposing thegate pad terminal and the gate pad by etching the passivation layer andthe gate insulating layer, and exposing the data pad terminal by etchingthe passivation layer. The gate insulating layer and the passivationlayer may contain silicon nitride or silicon oxide. The etchant foretching the passivation layer may include hydrogen fluoride (HF).

In another aspect, a method of manufacturing an array substrate for aliquid crystal display device includes forming a gate electrode, a gateline, and a gate pad on a substrate by sequentially depositing a metallayer and a transparent conductive layer and patterning, , forming agate insulating layer on the gate electrode, the gate line, and the gatepad, forming an active layer on the gate insulating layer over the gateelectrode, forming an ohmic contact layer on the active layer, formingsource and drain electrodes, a data line and a data pad on the ohmiccontact layer, forming a pixel electrode contacting the drain electrode,forming a data pad terminal covering the data pad, forming a passivationlayer on the pixel electrode and the data pad terminal, exposing thegate pad by etching the passivation layer and the gate insulating layer,and exposing the data pad terminal by etching the passivation layer. Thetransparent conductive layer may be one of indium-tin-oxide (ITO) andindium-zinc-oxide (IZO). The step of forming the active layer and thestep of forming source and drain electrodes, the data line and the datapad can be processed through one photolithographic process. At thistime, the photolithographic process may use a diffraction exposuretechnique. The insulating layer and the passivation layer containsilicon nitride or silicon oxide. The etchant for etching thepassivation layer includes hydrogen fluoride (HF). The step of formingthe gate pad terminal and the data pad terminal is carried outsimultaneously with the step of forming the pixel electrode.

It is to be understood that both the foregoing general description andthe following detailed description are exemplary and explanatory and areintended to provide further explanation of the present invention asclaimed.

BRIEF DESCRIPTION OF THE DRAWINGS

The present invention will become more fully understood from thedetailed description given hereinbelow and the accompanying drawingswhich are given by way of illustration only, and thus are not limitativeof the present invention, and wherein:

FIG. 1 is a cross sectional view of an array substrate for an LCD deviceaccording to the related art;

FIGS. 2A to 2F are cross sectional views of a manufacturing method ofthe array substrate according to a first embodiment of the presentinvention;

FIG. 3 is a schematic plan view of the array substrate according to thefirst embodiment of the present invention;

FIG. 4 is a cross sectional view of the array substrate according to thefirst embodiment of the present invention;

FIGS. 5A to 5G are cross sectional views of a manufacturing method ofthe array substrate according to a second embodiment of the invention;

FIG. 6 is a photo illustrating the gate pad portion of the invention;

FIGS. 7A to 7E are cross sectional views of a manufacturing method ofthe array substrate according to a third embodiment of the presentinvention;

FIG. 8 shows a schematic plan view of the array substrate according tothe third embodiment of the present invention;

FIGS. 9A to 9E are cross sectional views of a manufacturing method ofthe array substrate according to a fourth embodiment of the presentinvention; and

FIG. 10 shows an etching process according to the fourth embodiment ofthe present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

Reference will now be made in detail to the illustrated embodiments ofthe present invention, which are illustrated in the accompanyingdrawings.

FIGS. 2A to 2F show a manufacturing process of an array substrate for aliquid crystal display (LCD) device according to the first embodiment ofthe present invention. As shown in FIG. 2A, a gate electrode 112, a gateline 114 and a gate pad 116 are formed by depositing and patterning ametal layer on a substrate 110 using a first mask. The gate line 114elongates in one direction, the gate electrode 112 is connected to thegate line 114, and the gate pad 116 is located at one end of the gateline 114. On the gate pad 116, a first KAPTON tape 160 is attached.

Next, as shown in FIG. 2B, a gate insulating layer 120, amorphoussilicon layer, a doped silicon layer are sequentially deposited, andpatterned into an active layer 122 and a doped semiconductor layer 124 ausing a second mask. The gate insulating layer 120 contains siliconnitride or silicon oxide.

Next, as shown in FIG. 2C, a metal layer is deposited and patternedusing a third mask to form source and drain electrodes 132 and 134, anda data pad 136. A portion of the doped semiconductor layer 124 a of FIG.2B between the source and drain electrodes is etched to form an ohmiccontact layer 124. The source and drain electrodes 132 and 134constitute a thin film transistor T with the gate electrode 112. Thoughnot shown, a data line is formed at this step. The data line isconnected to the source electrode 132 and has the data pad 136 at oneend.

Next, as shown in FIG. 2D, a transparent conductive material isdeposited and patterned using a photolithographic method and a fourthmask to form a pixel electrode 142 and a data pad terminal 146. Thepixel electrode 142 is connected to the drain electrode 134 and the datapad terminal 146 covers the data pad 136. Sequentially, a second KAPTONtape 170 is attached on the data pad terminal 146 to cover the data padterminal 146.

Next, as shown in FIG. 2E, a passivation layer 150 of silicon nitride orsilicon oxide is formed to cover the substrate 110 having the secondKAPTON tape 170.

The array substrate having the first and second KAPTON tapes 160 and 170is shown in FIG. 3, which is a schematic plan view at this step. Asshown, a display region A having a plurality of thin film transistorsand the pixel electrodes is defined on the substrate 110, and outside ofthe display region A the gate pad 116 and the data pad 136 are formed,on which the first and second KAPTON tapes 160 and 170 are attached,respectively.

Next, as shown in FIG. 2F, the first and second KAPTON tapes 160 and 170(FIG. 2E) are detached such that the gate insulating layer 120 and thepassivation layer 150 over the first KAPTON tape 160 (FIG. 2E), and thepassivation layer 150 over the second KAPTON tape 170 are removed,respectively. Therefore, the gate pad 116 and the data pad terminal 146are exposed.

As explained above, in this embodiment, by using the KAPTON tapes, thepads can be exposed and thus, the array substrate can be manufactured byusing four masks.

In the meantime, by using the diffraction exposure technique the sourceand drain electrodes and the active layer can be formed in onephotolithographic process, and in this case, the manufacturing processesis further decreased. The array substrate manufactured using thediffraction technique is shown in FIG. 4. The active layer 122 a has thesame shape as the source and drain electrodes 132 and 134 except for aportion disposed between the source and drain electrodes 132 and 134.The ohmic contact layer 124 a has the same shape as the source and drainelectrodes 132 and 134. The amorphous silicon layer and the dopedsilicon layer are also under the data pad 136.

If a metal mask is used, the pad can be exposed, which is shown in FIGS.5A to 5G. In this second embodiment, the source and drain electrodes andthe active layer are formed in one photolithographic process using thediffraction exposure technique.

As shown in FIG. 5A, a metallic material is deposited on the transparentsubstrate 210 and patterned by using a first mask to form a gateelectrode 212, a gate line 214, and a gate pad 216. The gate line 214 iselongated in one direction and has the gate electrode 212 and the gatepad 216 as in first embodiment.

Next, as shown in FIG. 5B, a first metal mask is disposed on the gatepad 216 and a gate insulating layer 220, an amorphous silicon layer 222a, a doped silicon layer 224 a, and a metal layer 230 are sequentiallyformed. At this time, the gate insulating layer 220, the amorphoussilicon layer 222 a, the doped silicon layer 224 a, and the metal layer230 are formed on the first metal mask 260. The gate insulating layer220 contains silicon nitride or silicon oxide.

Next, as shown in FIG. 5C, after removing the first metal mask 260 (FIG.5B), a photoresist layer is deposited, exposed to light, and patternedto form photoresist patterns 272, 274 and 276. At this point, the firstphotoresist pattern 272 having a first thickness is formed where sourceand drain electrodes and a data pad will be formed. The secondphotoresist pattern 274 having a second thickness is positioned where achannel between the source and drain electrodes will be formed. Thesecond thickness is smaller than the first thickness. The thirdphotoresist pattern 276 covers the gate pad 216.

Next, as shown in FIG. 5D, by using the photoresist patterns 272, 274and 276, source and drain electrodes 232 and 234, a data pad 236, anohmic contact layer 224, and an active layer 222 are formed and thephotoresist patterns 272, 274 and 276 are removed. At this time, theohmic contact layer 224 has the same shape as the source and drainelectrodes 232 and 234, and the active layer 222 has the same shape asthe source and drain electrodes 232 and 234 except a portion between thesource and drain electrodes 232 and 234. The source and drain electrodes232 and 234 constitutes a thin film transistor T2 with the gateelectrode 212. Though not shown, a data line is formed at this step. Thedata line is connected to the source electrode 232 and has the data pad236 at one end. Under the data line the amorphous silicon layer and thedoped silicon layer are left.

Next, as shown in FIG. 5E, a transparent conductive material isdeposited and patterned to form a pixel electrode 242, a gate padterminal 244, and the data pad terminal 246 using a third mask. Thepixel electrode 242 is connected to the drain electrode 234, the gatepad terminal 244 and the data pad terminal 246 and covers the gate pad216 and data pad 246, respectively. The transparent conductive materialcan be indium-tin-oxide (ITO) or indium-zinc-oxide (IZO).

Next, as shown in FIG. 5F, on the gate pad terminal 244 and on the datapad terminal 246, second and third metal masks 282 and 284 arepositioned and then, the passivation layer 250 is deposited entirely.The passivation layer 250 is also positioned on the second and thirdmetal masks 282 and 284.

Next, as shown in FIG. 5G, the gate pad terminal 244 and the data padterminal 246 are exposed by removing the second and the third metalmasks 282 and 284.

Therefore, the gate pad terminal and the data pad terminal can beexposed without any further photolithographic process to achieve lowmanufacturing cost and shorten the manufacturing time. As a modificationof this second embodiment, the source and drain electrodes, and theactive layer can be formed by separate photolithographic processes.

In the meantime, after the completed array substrate is combined with acolor filter substrate, the pads can be exposed by dipping the padportion into the etchant for silicon nitride or silicon oxide, therebyreducing the process. The gate pad formed by this method is shown inFIG. 6 which is a photo produced by a scanning electron microscope. Theexposed pad has an undercut portion B where the substrate under the gatepad is also etched. Therefore in attaching a PCB, the gate pad canseparate.

The third embodiment of the present invention is directed to solvingthis problem and is illustrated in FIGS. 7A to 7E and FIG. 8.

As shown in FIG. 7A, a gate electrode 312, a gate line 314 and a gatepad 316 are formed on a substrate 310 using a first mask.

Next, as shown in FIG. 7B, a gate insulating layer 320, an amorphoussilicon layer, a doped silicon layer, and a metal layer are sequentiallydeposited, and patterned using a second mask for a diffraction exposuretechnique to form source and drain electrodes 332 334, a data pad 336,an ohmic contact layer 324, and an active layer 322 through onephotolithographic process. At this time, the ohmic contact layer 324 hasthe same shape as the source and drain electrodes 332 and 334, and theactive layer 322 has the same shape as the source and drain electrodes332 and 334 except the portion between the source and drain electrodes332 and 334. The source and drain electrodes 332 and 334 constitutes athin film transistor T3 with the gate electrode 312. Though not shown, adata line is formed at this step. The data line is connected to thesource electrode 332 and has the data pad 336 at one end. Under the datapad 336, the amorphous silicon layer and the doped silicon layer areleft.

Next, as shown in FIG. 7C, a transparent conductive material isdeposited and patterned to form a pixel electrode 342, a gate padterminal 344, and the data pad terminal 346 using a third mask. Thepixel electrode 342 is connected to the drain electrode 334, the gatepad terminal 344 and the data pad terminal 346 and covers the gate pad316 and data pad 346, respectively. At this point, a portion of the gateinsulating layer 320 on the gate pad is open by the gate pad terminal344. The transparent conductive material can be indium-tin-oxide (ITO)or indium-zinc-oxide (IZO).

Next, as shown in FIG. 7D, a passivation layer of silicon nitride orsilicon oxide is formed.

Next, as shown in FIGS. 7E and 8, the gate pad portion and the data padportion are dipped into etchant 370 to expose the gate pad terminal 344,the gate pad 316, and the data pad terminal 346. At this time, a portionof the passivation layer 350 in the data pad portion is removed, whereasin the gate pad portion not only the passivation 350 but also the gateinsulating layer 320 uncovered by the gate pad terminal 344 is removedto expose the gate pad 316. At this point a portion of the gateinsulating layer 320 beneath the gate pad terminal 344 can be overetched. The etchant or etching solution is for etching silicon nitrideor silicon oxide layers and may include hydrogen fluoride (HF).

This step can be carried out after forming the passivation layer 350 orafter combining the array substrate and the color filter substrate. Thereference numeral 360 in FIG. 8 indicates a seal pattern between the twosubstrates.

In the third embodiment, since the gate pad terminal 344 of atransparent conductive material covers the gate pad 316 and the sideportion of the gate pad 316 is not exposed, in attaching the PCB, thegate pad 316 will not separate.

In this way, damage to the gate pad can be prevented by adopting adouble layer structure composed of a metal layer and a transparentconductive layer. The fourth embodiment shows this structure.

First, as shown in FIG. 9A, a metallic material and a transparentconductive material is sequentially deposited on the substrate 410 andpatterned using a first mask to form a gate electrode 412 a and 412 b, agate line 414 a and 414 b, and a gate pad 416 a and 416 b that have adouble structure. The transparent conductive material can beindum-tin-oxide.

Next, as shown in FIG. 9B, a gate insulating layer 420, an amorphoussilicon layer, a doped silicon layer, and a metal layer are sequentiallydeposited, and patterned using a second mask for a diffraction exposuretechnique to form source and drain electrodes 432 434, a data pad 436,an ohmic contact layer 424, and an active layer 422 through onephotolithographic process. At this time, the ohmic contact layer 424 hasthe same shape as the source and drain electrodes 432 and 434, and theactive layer 422 has the same shape as the source and drain electrodes432 and 434 except a portion between the source and drain electrodes 432and 434. The source and drain electrodes 432 and 434 constitutes a thinfilm transistor T4 with the gate electrode 412. Though not shown, a dataline is formed in this step. The data line is connected to the sourceelectrode 432 and has the data pad 436 at one end. Under the data pad436, the amorphous silicon layer and the doped silicon layer are left.

Next, as shown in FIG. 9C, a transparent conductive material isdeposited and patterned to form a pixel electrode 442 and a data padterminal 446 using a third mask. The pixel electrode 442 is connected tothe drain electrode 434, and the data pad terminal 446 covers the datapad 436. The transparent conductive material can be indium-tin-oxide(ITO) or indium-zinc-oxide (IZO).

Next, as shown in FIG. 9D, a passivation layer of silicon nitride orsilicon oxide is formed over the entire composite.

Next, as shown in FIGS. 9E and 10, the gate pad portion and the data padportion are dipped into etchant 470 to expose the gate pad 416 a and 416b, and the data pad terminal 446. At this time, a portion of thepassivation layer 450 in the data pad portion is removed, whereas in thegate pad portion not only the passivation 450 but also the gateinsulating layer 420 is removed to expose the gate pad 416 a and 416 b.The etchant or etching solution is used for etching silicon nitride orsilicon oxide layers and may include hydrogen fluoride (HF).

This step can be carried out after forming the passivation layer 450 orafter combining the array substrate and the color filter substrate. Thereference numeral 460 in FIG. 8 indicates a seal pattern between the twosubstrates.

In this fourth embodiment, since the upper portions of the gate pad andthe data pad have a transparent material such as indum-tin-oxide, thedamage of the pad can be prevented.

It will be apparent to those skilled in the art that variousmodifications and variations can be made in the fabrication andapplication of the present invention without departing from the spiritor scope of the invention. Thus, it is intended that the presentinvention cover the modifications and variations of this inventionprovided they come within the scope of the appended claims and theirequivalents.

1. A method of manufacturing an array substrate for a liquid crystaldisplay device which comprises: forming a gate electrode, a gate line,and a gate pad on a substrate; forming a gate insulating layer on thegate electrode, the gate line, and the gate pad; forming an active layeron the gate insulating layer over the gate electrode; forming an ohmiccontact layer on the active layer; forming source and drain electrodes,a data line and a data pad on the ohmic contact layer; forming a pixelelectrode contacting the drain electrode; forming a gate pad terminal onthe gate insulating layer such that a portion of the gate insulatinglayer is open over the gate pad; forming a data pad terminal coveringthe data pad; forming a passivation layer on the pixel electrode, thegate pad terminal and the data pad terminal; exposing the gate padterminal and the gate pad by etching the passivation layer and the gateinsulating layer; and exposing the data pad terminal by etching thepassivation layer.
 2. The method according to claim 1, wherein the stepof forming the active layer and the step of forming source and drainelectrodes, the data line and the data pad are processed through onephotolithographic process.
 3. The method according to claim 2, whereinthe photolithographic process uses a diffraction exposure technique. 4.The method according to claim 1, wherein the gate insulating layer andthe passivation layer contain silicon nitride or silicon oxide.
 5. Themethod according to claim 4, wherein the etchant for etching thepassivation layer includes hydrogen fluoride (HF).
 6. The methodaccording to claim 1, wherein the step of forming the gate pad terminaland the data pad terminal is carried out simultaneously with the step offorming the pixel electrode.